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Direct fabrication of micron-scale structures using Super Inkjet technology
Dr. Kazuhiro MurataCEOSITechnology, Inc.
WHEN:
Monday, September 17, 2018 @ 10:00 am
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We have developed a super-fine inkjet technology (SIJ) that enables extremely fine pattern formation using droplets measuring less than 1 micrometer in diameter. By using conductive ink based on nano-metal particles, direct fabrication of circuits and three-dimensional structures having a feature size of just a few microns are achieved. Moreover the SIJ is capable of printing with a wide variety of inks, for example, insulators, organic semiconductors, light emitting polymers, bio-materials and UV curable polymers. The potential of the SIJ technology and its application to cutting-edge areas, such as flexible electronics, printed electronics, fine interconnect and others will be shown.